The EFSL research group, in collaboration with University of Rome Tor Vergata, INFN, Bruno Kessler Foundation and Chalmers University of Technology, has published a paper in Nanoscale journal entitled “Stoichiometric Bi₂Se₃ topological insulator ultrathin films obtained through a new fabrication process for optoelectronic applications”, by Matteo Salvato, Mattia Scagliotti, Maurizio De Crescenzi, Paola Castrucci, Fabio De Matteis, Michele Crivellari, Stefano Pelli Cresi, Daniele Catone, Thilo Bauch and Floriana Lombardi.

https://doi.org/10.1039/D0NR02725A